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PLD法における薄膜成長初期過程の観察
http://hdl.handle.net/10458/423
http://hdl.handle.net/10458/423fc405453-1782-40ff-adba-346b7ca73a58
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
KJ00004439498.pdf (1.5 MB)
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| Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2007-06-28 | |||||
| タイトル | ||||||
| タイトル | PLD法における薄膜成長初期過程の観察 | |||||
| 言語 | ja | |||||
| タイトル | ||||||
| タイトル | Observation of initial stage of a film formation by PLD onto Si clean surface | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | jpn | |||||
| キーワード | ||||||
| 言語 | en | |||||
| 主題Scheme | Other | |||||
| 主題 | PLD, STM, TOF, Si(111), Atomic level, Surface, Fe, FeSi2, Ablation | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | departmental bulletin paper | |||||
| その他（別言語等）のタイトル | ||||||
| その他のタイトル | PLDホウ ニ オケル ハクマク セイチョウ ショキ カテイ ノ カンサツ | |||||
| 言語 | ja-Kana | |||||
| 著者 |
吉田, 智司
× 吉田, 智司× 中村, 幸司× 横谷, 篤至× Yoshida, Satoshi |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | However the PLD method is widely used for fabrication of the various films, information of an interface between the substrate and the film, which is a key for the quality of the film, has not been clarified well. Because it is difficult to observe the interface through the deposited film, we have tried to observe the adhesion process of atoms which compose the film onto the substrate surface. We used the STM for observation and the TOF analyzer for identification of the particles generated by PLD process. Si(111) surface which had been cleaned by the high temperature thermal etching method was used as a substrate. In this work, Fe was used as a target material in order to observe the simplified interaction between Fe and Si atoms intended to understand the initial stage of formation of β-FeSi2 films onto the Si substrate. A Nd:YAG2ω(532 nm) used for PLD. As a result, we found that three kinds of sites where the Fe atoms were preferably adsorbed. One is the centre of three comer holes of Si(lll) 7x7 structure. Another is the intermediate of the two corner holes, the other is beside of corner hole. In the former case, special shape iron cluster is adsorbed and latter two cases, ellipsoidal shape cluster is adsorbed. |
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| 言語 | en | |||||
| 書誌情報 |
ja : 宮崎大学工学部紀要 en : Memoirs of Faculty of Engineering, University of Miyazaki 巻 35, p. 113-117, 発行日 2006-08-30 |
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| 出版者 | ||||||
| 出版者 | 宮崎大学工学部 | |||||
| 言語 | ja | |||||
| 出版者 | ||||||
| 出版者 | Faculty of Engineering, University of Miyazaki | |||||
| 言語 | en | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 05404924 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00732558 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
