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NLDプラズマ生成技術を用いたスパッタリングへの応用
http://hdl.handle.net/10458/365
http://hdl.handle.net/10458/3655c5641ab-1836-457c-8345-a58de07b4428
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
KJ00003579356.pdf (2.2 MB)
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| Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2007-06-28 | |||||
| タイトル | ||||||
| タイトル | NLDプラズマ生成技術を用いたスパッタリングへの応用 | |||||
| 言語 | ja | |||||
| タイトル | ||||||
| タイトル | Neutral Loop Discharge Plasma for Sputtering Application | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | jpn | |||||
| キーワード | ||||||
| 言語 | en | |||||
| 主題Scheme | Other | |||||
| 主題 | Neutral Loop Discharge (NLD), Null, Sputter | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | departmental bulletin paper | |||||
| その他（別言語等）のタイトル | ||||||
| その他のタイトル | NLD プラズマ セイセイ ギジュツ オ モチイタ スパッタリング エノ オウヨウ | |||||
| 言語 | ja-Kana | |||||
| 著者 |
楊, 鍾煥
× 楊, 鍾煥× 川尻, 晋平× 池田, 一貴× 本田, 親久× 大坪, 昌久× 成, 烈汶× Yang, Jong-Hwan× 川尻, 晋平× Ikeda, Kazutaka× 成, 烈汶 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Abstract A new type of plasma system based on the Magnetic Neutral Loop Discharge (NLD) concept has been developed for sputter application. The electron density and ion current density possessing peaks at the null region, it was ascertained that the electron heating around null region is also essential for plasma production in this capacitive type null field configuration. Also, two distinctive factors, such as secondary electrons trapping and normalized electric field (F) were found to explain the measured profile of the electron temperature. From the thin film experiments, it could be found that the thickness uniformity was well enhanced with the substrate rotation and dynamical plasma control although further detail work is necessary to establish this. Furthermore, it is expected that the dynamic control of plasma over the target surface will be realized, because rotating and arranging the outer permanent magnets can actively control the position and area of magnetic null field region. With plasma application, the enhancement of target erosion and its uniformity are possible. Although further work is necessary to establish the plasma dynamic control, this magnetic null discharge concept is expected realize very uniform processing over a large area. |
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| 言語 | en | |||||
| 書誌情報 |
ja : 宮崎大学工学部紀要 en : Memoirs of Faculty of Engineering, University of Miyazaki 巻 34, p. 47-52, 発行日 2005-08 |
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| 出版者 | ||||||
| 出版者 | 宮崎大学工学部 | |||||
| 言語 | ja | |||||
| 出版者 | ||||||
| 出版者 | Faculty of Engineering, University of Miyazaki | |||||
| 言語 | en | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 05404924 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00732558 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
