@article{oai:miyazaki-u.repo.nii.ac.jp:00002392,
 author = {楊, 鍾煥 and 川尻, 晋平 and Kawashiri, Shinpei and 池田, 一貴 and 本田, 親久 and Honda, Chikahisa and 大坪, 昌久 and Otsubo, Masahisa and Sung, Youl-Moon and Sung, Youl Moon and 成, 烈汶 and Yang, Jong-Hwan and 川尻, 晋平 and Kawashiri, Shinpei and Ikeda, Kazutaka and Sung, Youl-Moon and Sung, Youl Moon and 成, 烈汶},
 journal = {宮崎大学工学部紀要, Memoirs of Faculty of Engineering, University of Miyazaki},
 month = {Aug},
 note = {Abstract 
A new type of plasma system based on the Magnetic Neutral Loop Discharge (NLD) concept has 
been developed for sputter application. The electron density and ion current density possessing peaks 
at the null region, it was ascertained that the electron heating around null region is also essential for 
plasma production in this capacitive type null field configuration. Also, two distinctive factors, such 
as secondary electrons trapping and normalized electric field (F) were found to explain the measured 
profile of the electron temperature. From the thin film experiments, it could be found that the 
thickness uniformity was well enhanced with the substrate rotation and dynamical plasma control 
although further detail work is necessary to establish this. Furthermore, it is expected that the 
dynamic control of plasma over the target surface will be realized, because rotating and arranging the 
outer permanent magnets can actively control the position and area of magnetic null field region. 
With plasma application, the enhancement of target erosion and its uniformity are possible. Although 
further work is necessary to establish the plasma dynamic control, this magnetic null discharge 
concept is expected realize very uniform processing over a large area.},
 pages = {47--52},
 title = {NLDプラズマ生成技術を用いたスパッタリングへの応用},
 volume = {34},
 year = {2005},
 yomi = {カワシリ, シンペイ and イケダ, カズタカ and ホンダ, チカヒサ and オオツボ, マサヒサ and ソン, ヤルブン and カワシリ, シンペイ and ソン, ヤルブン}
}