{"created":"2023-05-15T09:58:26.023446+00:00","id":2392,"links":{},"metadata":{"_buckets":{"deposit":"3234bb05-79d5-4afb-9611-6a62aea61891"},"_deposit":{"created_by":5,"id":"2392","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"2392"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00002392","sets":["73","73:36","73:36:330","73:36:330:315"]},"author_link":["6715","11933","11939","15997","11941","6637","6647","11935"],"item_10002_alternative_title_1":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"NLD プラズマ セイセイ ギジュツ オ モチイタ スパッタリング エノ オウヨウ","subitem_alternative_title_language":"ja-Kana"}]},"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2005-08","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"52","bibliographicPageStart":"47","bibliographicVolumeNumber":"34","bibliographic_titles":[{"bibliographic_title":"宮崎大学工学部紀要","bibliographic_titleLang":"ja"},{"bibliographic_title":"Memoirs of Faculty of Engineering, University of Miyazaki","bibliographic_titleLang":"en"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Abstract \nA new type of plasma system based on the Magnetic Neutral Loop Discharge (NLD) concept has \nbeen developed for sputter application. The electron density and ion current density possessing peaks \nat the null region, it was ascertained that the electron heating around null region is also essential for \nplasma production in this capacitive type null field configuration. Also, two distinctive factors, such \nas secondary electrons trapping and normalized electric field (F) were found to explain the measured \nprofile of the electron temperature. From the thin film experiments, it could be found that the \nthickness uniformity was well enhanced with the substrate rotation and dynamical plasma control \nalthough further detail work is necessary to establish this. Furthermore, it is expected that the \ndynamic control of plasma over the target surface will be realized, because rotating and arranging the \nouter permanent magnets can actively control the position and area of magnetic null field region. \nWith plasma application, the enhancement of target erosion and its uniformity are possible. Although \nfurther work is necessary to establish the plasma dynamic control, this magnetic null discharge \nconcept is expected realize very uniform processing over a large area.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宮崎大学工学部","subitem_publisher_language":"ja"},{"subitem_publisher":"Faculty of Engineering, University of Miyazaki","subitem_publisher_language":"en"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00732558","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"05404924","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"楊, 鍾煥","creatorNameLang":"ja"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"川尻, 晋平","creatorNameLang":"ja"},{"creatorName":"カワシリ, シンペイ","creatorNameLang":"ja-Kana"},{"creatorName":"Kawashiri, Shinpei","creatorNameLang":"en"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"池田, 一貴"},{"creatorName":"イケダ, カズタカ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"本田, 親久","creatorNameLang":"ja"},{"creatorName":"ホンダ, チカヒサ","creatorNameLang":"ja-Kana"},{"creatorName":"Honda, Chikahisa","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"大坪, 昌久","creatorNameLang":"ja"},{"creatorName":"オオツボ, マサヒサ","creatorNameLang":"ja-Kana"},{"creatorName":"Otsubo, Masahisa","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"Sung, Youl-Moon","creatorNameLang":"en"},{"creatorName":"Sung, Youl Moon","creatorNameLang":"en"},{"creatorName":"成, 烈汶","creatorNameLang":"ja"},{"creatorName":"ソン, ヤルブン","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{},{}],"givenNames":[{},{},{},{}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yang, Jong-Hwan","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"川尻, 晋平","creatorNameLang":"ja"},{"creatorName":"カワシリ, シンペイ","creatorNameLang":"ja-Kana"},{"creatorName":"Kawashiri, Shinpei","creatorNameLang":"en"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Ikeda, Kazutaka","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"Sung, Youl-Moon","creatorNameLang":"en"},{"creatorName":"Sung, Youl Moon","creatorNameLang":"en"},{"creatorName":"成, 烈汶","creatorNameLang":"ja"},{"creatorName":"ソン, ヤルブン","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{},{}],"givenNames":[{},{},{},{}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-21"}],"displaytype":"detail","filename":"KJ00003579356.pdf","filesize":[{"value":"2.2 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00003579356.pdf","url":"https://miyazaki-u.repo.nii.ac.jp/record/2392/files/KJ00003579356.pdf"},"version_id":"9dc592f0-c507-435b-99f3-a49bd4f7401b"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Neutral Loop Discharge (NLD), Null, Sputter","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"NLDプラズマ生成技術を用いたスパッタリングへの応用","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"NLDプラズマ生成技術を用いたスパッタリングへの応用","subitem_title_language":"ja"},{"subitem_title":"Neutral Loop Discharge Plasma for Sputtering Application","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"5","path":["73","36","330","315"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-06-28"},"publish_date":"2007-06-28","publish_status":"0","recid":"2392","relation_version_is_last":true,"title":["NLDプラズマ生成技術を用いたスパッタリングへの応用"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2023-11-29T00:46:53.897928+00:00"}