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Development of Silicon Nanoparticle Films Using a Reactive Chemically Adsorbed Monolayer Technique
http://hdl.handle.net/10458/6843
http://hdl.handle.net/10458/6843534f6b42-fb68-41da-9eb6-7bfc95439b3a
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
本文 (2.5 MB)
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| Item type | 会議発表論文 / Conference Paper(1) | |||||
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| 公開日 | 2020-06-22 | |||||
| タイトル | ||||||
| タイトル | Development of Silicon Nanoparticle Films Using a Reactive Chemically Adsorbed Monolayer Technique | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||
| 資源タイプ | conference paper | |||||
| 著者 |
Sasaki, Teruyoshi
× Sasaki, Teruyoshi× Ogawa, Kazufumi× 須崎, 嘉文 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | In this study, a silicon nanoparticle film using a reactive chemically adsorbed monolayer (CAM) has been developed. First, p-type and n-type silicon nanoparticles around 100 nm in diameter were successfully produced by the centrifugal separation processing. Second, reactive CAM with epoxy groups was formed on the surface of the silicon nanoparticles. Third, for preparation of a silicon particle pastes, cross-linking agent containing thiol or amino groups were individual added to the silicon nanoparticle dispersed in the organic solvent. Finally, the silicon particle paste was coated on a glass plate. The glass plate was then heated at 150 ℃ for 1 hour with an electric furnace. A high density the silicon nanoparticle thin film about 3 μm in thickness was thus successfully formed. | |||||
| 言語 | en | |||||
| 書誌情報 |
en : International Conference on Science, Technology & Education (ICSTE 2016) p. 193-196, 発行日 2016-09 |
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| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
