WEKO3
アイテム
There is a newer version of this record available.
A Case Study of Fabrication of Film with Spark Technique
http://hdl.handle.net/10458/6777
http://hdl.handle.net/10458/677787251a39-91bf-4a59-b271-8ba68363a91d
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
本文 (381.9 kB)
|
|
| Item type | 会議発表論文 / Conference Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2020-06-21 | |||||
| タイトル | ||||||
| タイトル | A Case Study of Fabrication of Film with Spark Technique | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||
| 資源タイプ | conference paper | |||||
| 著者 |
N., Thungsuk
× N., Thungsuk× B., Kunnalao× T., Tanaram |
|||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | The purpose of this research was to the fabrication of ITO thin film was using the spark technique with high voltage on silicon wafer substrate. In order to confirm the ITO surface on silicon wafer substrate, the film was investigated of surface morphology with SEM/EDS. The spark method for fabrication of film was using 10 V of spark voltage, 10 kHz of frequency and 30 minutes of spark time. The sample was annealed difference confirms the formation of ITO thin film on the substrate with result from SEM/EDS. In addition, when the long time annealed as a result of the ITO thin film was better film from a uniform of surface. | |||||
| 言語 | en | |||||
| 書誌情報 |
en : International Conference on Applied Electrical and Mechanical Engineering 2019 p. 123-126, 発行日 2019-09 |
|||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
