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Effect of Post-Annealing in Nitrogen gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
http://hdl.handle.net/10458/5767
http://hdl.handle.net/10458/576709aec057-3296-41f2-b382-22df52795c5f
| Item type | 会議発表論文 / Conference Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2020-06-21 | |||||
| タイトル | ||||||
| タイトル | Effect of Post-Annealing in Nitrogen gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||
| 資源タイプ | conference paper | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
山口, 堅三
× 山口, 堅三× 湯地, 敏史× 鹿間, 共一× 須崎, 嘉文× Du, Jinlong× Yamaguchi, Kenzo× Shikama, Tomokazu× 須崎, 嘉文 |
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| 書誌情報 |
en : International Conference on Applied Electrical and Mechanical Engineering 2015 (The Japan - Thailand - Lao P.D.R - Korea - China Joint Friendship) and 2nd Asian Conference on Electrical Installation and Applied Technology p. 215-220, 発行日 2015-08 |
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| 出版者 | ||||||
| 出版者 | King Mongkut's University of Technology Thonburi | |||||
| 言語 | en | |||||
| ISBN | ||||||
| 識別子タイプ | ISBN | |||||
| 関連識別子 | 9789744567673 | |||||
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山口, 堅三, 湯地, 敏史, 鹿間, 共一, 須崎, 嘉文, Du, Jinlong, Yamaguchi, Kenzo, Shikama, Tomokazu, 須崎, 嘉文, 2015, Effect of Post-Annealing in Nitrogen gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma: King Mongkut's University of Technology Thonburi, 215–220 p.
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