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全反射臨界角近傍でのX線回折法によるシリコン結晶中の微小格子歪の観察・評価
http://hdl.handle.net/10458/239
http://hdl.handle.net/10458/239947498f8-e961-40e8-ae08-2d94c9e6e8e8
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
KJ00002419420.pdf (1.5 MB)
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| Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2007-06-28 | |||||
| タイトル | ||||||
| タイトル | 全反射臨界角近傍でのX線回折法によるシリコン結晶中の微小格子歪の観察・評価 | |||||
| 言語 | ja | |||||
| タイトル | ||||||
| タイトル | Characterization of Minute Strain Field in Si Crystals by X-Ray Topography with a Glancing Angle Near the Critical Angle | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | jpn | |||||
| キーワード | ||||||
| 言語 | en | |||||
| 主題Scheme | Other | |||||
| 主題 | X-rays, Silicon oxide film, Asymmetric reflection, Minute strain field, Topography | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | departmental bulletin paper | |||||
| その他（別言語等）のタイトル | ||||||
| その他のタイトル | ゼンハンシャ リンカイカク キンボウ デノ Xセンカイセキホウ ニ ヨル シリコン ケッショウチュウ ノ ビショウ コウシワイ ノ カンサツ・ヒョウカ | |||||
| 著者 |
坂元, 誠志
× 坂元, 誠志× 福森, 太一郎× Sakamoto, Masayuki× Fukumori, Taichiro |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Abstract As dynamic random access memories and imaging devices continue to be made smaller, the quality of the silicon surfaces on which they are made becomes more and more important. The surface damage introduced by mechanochemical polishing is reported as one of the causes that degrade a device performance. For this reason, powerful characterization techniques for surface damage are strongly required. As the one method, X-ray topography using extremely asymmetric diffraction under the simultaneous diffraction condition is effective for imaging a minute strain field near the surface. In the present study, characterization of the minute strain field in silicon crystals with oxide film of 5nm and 25nm thick was performed using extremely asymmetrical X-ray diffraction of 311 reflection using the Berg-Barrett method and the double-crystal method. A series of X-ray topographs were taken around the Bragg peak and off-Bragg angles on both sides of incident angle. The reverse contrast was observed between topographs taken at strain field occurring at both sides of oxide film of 5nm thick and surface defect images arising from the mechanochemical polishing were clearly visualized. |
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| 言語 | en | |||||
| 書誌情報 |
ja : 宮崎大学工学部紀要 en : Memoirs of Faculty of Engineering, University of Miyazaki 巻 32, p. 31-38, 発行日 2003-07 |
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| 出版者 | ||||||
| 出版者 | 宮崎大学工学部 | |||||
| 言語 | ja | |||||
| 出版者 | ||||||
| 出版者 | Faculty of Engineering, University of Miyazaki | |||||
| 言語 | en | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 05404924 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00732558 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
