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Modeling of the electron motion in a capacitively coupled magnetic null plasma
http://hdl.handle.net/10458/1151
http://hdl.handle.net/10458/1151e1fc367e-95b0-4a65-a742-b266e8dae5ef
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2008-02-04 | |||||
タイトル | ||||||
タイトル | Modeling of the electron motion in a capacitively coupled magnetic null plasma | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
キーワード | Capacitively coupled plasma, electron meandering motion, magnetic null-field, neutral loop discharge plasma, sputtering | |||||
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資源タイプ | journal article | |||||
著者 |
成, 烈汶
× 成, 烈汶× Okraku-Yirenkyi, Yaw× Otsubo, Masahisa× Honda, Chikahisa× Uchino, Kiichiro× Muraoka, Katsunori |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | A new type of plasma system based on the neutral loop discharge (NLD) concept is being developed for research aimed at sputtering application. This system is characterized by plasma production around the muitinull magnetic field on the target surface, where a capacitive RF electric field is applied. From the results of the electron motion modeling in this system, we found that electrons around the magnetic null region on the target surface moved in meandering orbits like in the original NLD concept. Initial modeling results on electron behavior and a photograph of plasma emission taken from the new NLD system are presented. |
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言語 | en | |||||
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内容記述タイプ | Other | |||||
内容記述 | ©2002 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. |
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言語 | en | |||||
書誌情報 |
en : IEEE transactions on plasma science 巻 30, 号 1, p. 142-143, 発行日 2002-02 |
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出版者 | IEEE Nuclear and Plasma Sciences Society | |||||
言語 | en | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 00933813 | |||||
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収録物識別子タイプ | NCID | |||||
収録物識別子 | AA0066803X | |||||
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出版タイプ | VoR |