{"created":"2023-05-15T10:01:25.080558+00:00","id":5987,"links":{},"metadata":{"_buckets":{"deposit":"6dc2963b-4164-4db6-8b61-9dd1050f4ef9"},"_deposit":{"created_by":5,"id":"5987","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"5987"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00005987","sets":["71","71:35"]},"author_link":["32037","197","24","32039","26557"],"item_10003_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2016-09","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"96","bibliographicPageStart":"93","bibliographic_titles":[{"bibliographic_title":"International Conference on Science, Technology & Education (ICSTE 2016)","bibliographic_titleLang":"en"}]}]},"item_10003_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"This research paper aims to present the Feasibility Study of Preparation of ZnO Thin Film by Chemical Vapor Deposition System on silicon wafer, B-doped p-type Si (100) wafer, with powder deposition. The plasma system for this experimental used mixture of argon (Ar) and oxygen (O2). The ZnO thin film was performed by heating the ZnO powder. The Ar and O2 gas have been heating in pipe with silicone belt heater and micro gas heater. The temperature was controlled by temperature control (PID). The results on silicon wafer was studies for find the optimization point to preparation of ZnO thin film on surface was in typical pyramid shape structure with crystal grain size.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10003_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Thaweesak, Tanaram","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"32037","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nuttee, Thungsuk","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"26557","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Harittapak, Apirat","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"32039","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"Mungkung, Narong","creatorNameLang":"en"}],"familyNames":[{"familyName":"Mungkung","familyNameLang":"en"}],"givenNames":[{"givenName":"Narong","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"197","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"0000000106573887","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"https://isni.org/isni/0000000106573887"}],"affiliationNames":[{"affiliationName":"宮崎大学","affiliationNameLang":"ja"},{"affiliationName":"University of Miyazaki","affiliationNameLang":"en"}]}],"creatorNames":[{"creatorName":"湯地, 敏史","creatorNameLang":"ja"},{"creatorName":"ユジ, トシフミ","creatorNameLang":"ja-Kana"},{"creatorName":"Yuji, Toshifumi","creatorNameLang":"en"},{"creatorName":"Yuji, Tosifumi","creatorNameLang":"en"}],"familyNames":[{"familyName":"湯地","familyNameLang":"ja"},{"familyName":"ユジ","familyNameLang":"ja-Kana"},{"familyName":"Yuji","familyNameLang":"en"},{"familyName":"Yuji","familyNameLang":"en"}],"givenNames":[{"givenName":"敏史","givenNameLang":"ja"},{"givenName":"トシフミ","givenNameLang":"ja-Kana"},{"givenName":"Toshifumi","givenNameLang":"en"},{"givenName":"Tosifumi","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"24","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"80418988","nameIdentifierScheme":"e-Rad_Researcher","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=80418988"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-21"}],"displaytype":"detail","filename":"icste2016_p93.pdf","filesize":[{"value":"2.7 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"本文","url":"https://miyazaki-u.repo.nii.ac.jp/record/5987/files/icste2016_p93.pdf"},"version_id":"a4123b2b-db4f-43b7-bf2e-8e9557f0dc20"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Zinc Oxide, Plasma CVD, Thin film","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Feasibility Study of Preparation of ZnO Thin Film by Chemical Vapor Deposition System","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Feasibility Study of Preparation of ZnO Thin Film by Chemical Vapor Deposition System","subitem_title_language":"en"}]},"item_type_id":"10003","owner":"5","path":["71","35"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-06-21"},"publish_date":"2020-06-21","publish_status":"0","recid":"5987","relation_version_is_last":true,"title":["Feasibility Study of Preparation of ZnO Thin Film by Chemical Vapor Deposition System"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2024-11-15T07:34:21.249105+00:00"}