@article{oai:miyazaki-u.repo.nii.ac.jp:00005027,
 author = {桑水流, 康記 and 井上, 祐貴 and Kameyama, Akihiro and 亀山, 晃弘 and Yokotani, Atsushi and 横谷, 篤至 and KUWAZURU, Yasunori and INOUE, Yuuki},
 journal = {宮崎大学工学部紀要, Memoirs of Faculty of Engineering, University of Miyazaki},
 month = {Jul},
 note = {Using ultrasonicwave, we have developed a technique to support the vaporization of TEOS which is hardly vaporized by only decompression in Vacuum ultraviolet chemical vapor deposition (VUV-CVD). Mist of TEOS with the averaged particle size of 4 μm was generated by an equipment combinating a double vessel system and an ultrasonic device of which freguency is 1.7 MHz. TEOS was successfully vaporized under the room temperature and atmospheric pressure by using this equipment, and flat SiO2-like films were deposited with the VUV-CVD method, using a Xe excimer lamp(λ=172 nm). Besides, by the observation with the scanning electron microscope it was found that a number of spherical particles of around 0.6 ~ 0.8 μm in diameter were observed on the film. We have also demonstrated that the spherical particles on the film surface can be reduced by reducing the mist particles from the introducing gas material.},
 pages = {95--99},
 title = {超音波気化支援装置を用いた真空紫外光 CVD による石英様薄膜の常圧形成に関する研究},
 volume = {45},
 year = {2016},
 yomi = {クワズル, ヤスノリ and Kuwazuru, Yasunori and イノウエ, ユウキ and カメヤマ, アキヒロ and ヨコタニ, アツシ}
}