@article{oai:miyazaki-u.repo.nii.ac.jp:00005026, author = {藤原, 光二郎 and Fujihara, Koujiro and 蛯原, 正裕 and Ebihara, Masahiro and Yokoyama, Hirosumi and 横山, 宏有 and Maeda, Koji and 前田, 幸治 and Maeda, Kouji and 藤原, 光二郎 and Fujihara, Koujiro and 蛯原, 正裕 and Ebihara, Masahiro and Yokohama, Hirosumi}, journal = {宮崎大学工学部紀要, Memoirs of Faculty of Engineering, University of Miyazaki}, month = {Jul}, note = {The crystalline Sr(Al2Si2O8) films on quartz glass substrate were grown by a RF magnetron sputtering method. Al2O3 and SrAl2O4 powder were used for the targets. The crystalized Al2O3 buffer layer needs to crystalize the thin film on quartz glass substrate. The deposited thin film was annealed at 1150℃ in H2/Ar gas for the improvement the crystallinity. The annealed film were identified a mixed phases of both crystalline SiO2 and Sr(Al2Si2O8). The existence of Eu2+ and Eu3+ ions in the films were confirmed by photoluminescence emission of broad peak at 380 nm and that of weak peaks at about 600 nm respectively. These results indicated that the embedded Al2O3 buffer layers and the annealing treatments were important in the emission of Eu2+ ions in Sr(Al2Si2O8) film.}, pages = {91--94}, title = {RF マグネトロンスパッタリング法を用いた薄膜蛍光体の作製とその発光特性の評価}, volume = {45}, year = {2016}, yomi = {フジハラ, コウジロウ and エビハラ, マサヒロ and ヨコヤマ, ヒロスミ and マエダ, コウジ and フジハラ, コウジロウ and エビハラ, マサヒロ} }