{"created":"2023-05-15T10:00:24.317497+00:00","id":4719,"links":{},"metadata":{"_buckets":{"deposit":"f89d1de0-d9f0-4539-9cee-7dd6cfbaf5b0"},"_deposit":{"created_by":5,"id":"4719","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"4719"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00004719","sets":["73","73:36","73:36:330","73:36:330:325"]},"author_link":["25576","25580","25599","12038","25578","25577","13615","25579"],"item_10002_alternative_title_1":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"シンクウ シガイ CVD オ モチイタ コウガク ソシ キバン ノ ヘイタンカ ショリ ギジュツ ニカンスル ケンキュウ"}]},"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2015-07-31","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"86","bibliographicPageStart":"83","bibliographicVolumeNumber":"44","bibliographic_titles":[{"bibliographic_title":"宮崎大学工学部紀要","bibliographic_titleLang":"ja"},{"bibliographic_title":"Memoirs of Faculty of Engineering, University of Miyazaki","bibliographic_titleLang":"en"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In order to shorten the processing period for polishing of substrates for optical components, we have developed a technique of flattening treatment of the substrate utilizing the vacuum ultraviolet method. The flattening property and the laser damage resistance of the treated substrate have been evaluated. Substrate with scratches in one direction was used for the flattening treatment. As a result, scratches with widths less than 0.5 μm were found to be covered smoothly after the 40 minute-deposition. Experiments to evaluate the laser damage resistance of the treated substrates were performed by the fourth harmonic and the second harmonic of Nd:YAG laser. The results indicated that the some of obtained values were high enough compared to the damage threshold of the dielectric multilayer films asuming to use for the high-reflactance mirrors. In the evaluation of laser damage resistance, it was found that a tendency of peeling of the film was due to differences in the absorption coefficient of the two laser wavelengths.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宮崎大学工学部","subitem_publisher_language":"ja"},{"subitem_publisher":"Faculty of Engineering, University of Miyazaki","subitem_publisher_language":"en"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00732558","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"05404924","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"川添, 圭祐","creatorNameLang":"ja"},{"creatorName":"カワゾエ, 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Yasunori","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"小野, 聡一郎","creatorNameLang":"ja"},{"creatorName":"オノ, ソウイチロウ","creatorNameLang":"ja-Kana"},{"creatorName":"Ono, Souichirou","creatorNameLang":"en"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"長川, 裕耶","creatorNameLang":"ja"},{"creatorName":"ナガカワ, ユウヤ","creatorNameLang":"ja-Kana"},{"creatorName":"Nagakawa, 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resistance","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"真空紫外 CVD を用いた光学素子基板の平坦化処理技術に関する研究","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"真空紫外 CVD を用いた光学素子基板の平坦化処理技術に関する研究","subitem_title_language":"ja"},{"subitem_title":"Flattening Treatment of Substrate for Optical Components Using the Vacuum Ultraviolet CVD","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"5","path":["73","36","330","325"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-06-21"},"publish_date":"2020-06-21","publish_status":"0","recid":"4719","relation_version_is_last":true,"title":["真空紫外 CVD を用いた光学素子基板の平坦化処理技術に関する研究"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2023-12-12T01:15:07.551310+00:00"}