@inproceedings{oai:miyazaki-u.repo.nii.ac.jp:00004210,
 author = {鄧, 鋼 and Den, Gan and 鐙, 鋼 and 堀辺, 大輔 and 徳永, 仁夫 and Tokunaga, Hitoo and 中西, 勉 and Nakanishi, Tsutomu and 池田, 清彦 and Ikeda, Kiyohiko and Kaizu, Koichi and 海津, 浩一 and Horibe, Daisuke and 徳永, 仁夫 and Tokunaga, Hitoo and 中西, 勉 and Nakanishi, Tsutomu},
 book = {機素潤滑設計部門講演会講演論文集, The Machine Design and Tribology Division meeting in JSME},
 issue = {8},
 month = {Apr},
 note = {This research is to present a new method for fatigue crack length measurement using an ion sputtered film, the thickness of which is several tens nanometer, based on the principle that the electric resistance of the film increases with the growth of a crack. The relationship between the electric resistance and width of the film was investigated and expressed accurately by a presented equation. A grid pattern ion sputtered film was proposed for crack length measurement. Fatigue crack lengths in a bending test specimen are measured with a grid pattern film and a microscope. From the comparisons of the crack length measured by the film and microscope, a good agreement is verified and the availability of the presented method is confirmed. Since the film is extremely thin, it can be used for the measurement of a micro crack as well as crack initiation detection.},
 pages = {53--54},
 publisher = {日本機械学会},
 title = {スパッタリング金属膜によるき裂長さの測定},
 volume = {2004},
 year = {2004},
 yomi = {デン, ガン and トウ, コウ and ホリベ, ダイスケ and トクナガ, ヒトオ and ナカニシ, ツトム and イケダ, キヨヒコ and カイズ, コウイチ and トクナガ, ヒトオ and ナカニシ, ツトム}
}