@inproceedings{oai:miyazaki-u.repo.nii.ac.jp:00004156,
 author = {津田, 勇 and Tsuda, Isamu and Yuji, Toshifumi and 湯地, 敏史 and Yuji, Tosifumi and 木之下, 広幸 and Kinoshita, Hiroyuki and 岡村, 好美 and Okamura, Yoshimi and Nuchuay, Peerapong and Thungsuk, Nuttee and Mungkung, Narong and Kasayapanand, Nat and 津田, 勇 and Tsuda, Isamu},
 book = {プラズマ研究会資料, The Papers of Technical Meeting on Plasma Science and Technology, IEE Japan},
 issue = {29},
 month = {May},
 pages = {53--58},
 publisher = {電気学会},
 title = {Development of Low-Pressure High-Frequency Plasma Chemical Vapor by Thin Film Deposition System},
 volume = {2014},
 year = {2014},
 yomi = {ツダ, イサム and ユジ, トシフミ and キノシタ, ヒロユキ and オカムラ, ヨシミ and ツダ, イサム}
}