{"created":"2023-05-15T09:59:05.822675+00:00","id":3175,"links":{},"metadata":{"_buckets":{"deposit":"17ca9987-d3a8-43b4-8a7f-a6da4f9683bf"},"_deposit":{"created_by":5,"id":"3175","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"3175"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00003175","sets":["73","73:44"]},"author_link":["13615"],"item_10007_description_14":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"平成15年―平成17年度科学研究費補助金(基盤(B))研究成果報告書","subitem_description_language":"ja","subitem_description_type":"Other"}]},"item_10007_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"http://dx.doi.org/10.1063/1.1652239"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1063/1.1652239","subitem_relation_type_select":"DOI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://dx.doi.org/10.1143/JJAP.44.1019"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1143/JJAP.44.1019","subitem_relation_type_select":"DOI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://dx.doi.org/10.1143/JJAP.44.7998"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1143/JJAP.44.7998","subitem_relation_type_select":"DOI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://dx.doi.org/10.1143/JJAP.44.7785"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1143/JJAP.44.7785","subitem_relation_type_select":"DOI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://dx.doi.org/10.1016/j.apsusc.2005.03.055"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1016/j.apsusc.2005.03.055","subitem_relation_type_select":"DOI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://dx.doi.org/10.1889/1.1927739"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1889/1.1927739","subitem_relation_type_select":"DOI"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://hdl.handle.net/10458/250"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://hdl.handle.net/10458/250","subitem_relation_type_select":"HDL"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://hdl.handle.net/10458/251"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://hdl.handle.net/10458/251","subitem_relation_type_select":"HDL"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://hdl.handle.net/10458/252"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://hdl.handle.net/10458/252","subitem_relation_type_select":"HDL"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://hdl.handle.net/10458/307"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://hdl.handle.net/10458/307","subitem_relation_type_select":"HDL"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://hdl.handle.net/10458/310"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://hdl.handle.net/10458/310","subitem_relation_type_select":"HDL"}},{"subitem_relation_name":[{"subitem_relation_name_text":"http://hdl.handle.net/10458/374"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://hdl.handle.net/10458/374","subitem_relation_type_select":"HDL"}}]},"item_10007_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"学術雑誌掲載論文の抜き刷りは出版社に著作権許諾が得られていないため未掲載","subitem_rights_language":"ja"}]},"item_10007_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-21"}],"displaytype":"detail","filename":"kameyama.pdf","filesize":[{"value":"9.4 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kameyama.pdf","url":"https://miyazaki-u.repo.nii.ac.jp/record/3175/files/kameyama.pdf"},"version_id":"152ed1e2-968a-4ed4-82d2-40871deade4b"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Sip, System LSI, System in Package, VUV-CVD, femto-second laser","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"エキシマランプ, システムLSI, フェムト秒レーザー, 光CVD, 半導体絶縁膜, 真空紫外, 真空紫外光, 真空紫外光CVD, 積層型システムLSI","subitem_subject_language":"ja","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_researcher":{"attribute_name":"研究代表者","attribute_type":"creator","attribute_value_mlt":[{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"Kameyama, Akihiro","creatorNameLang":"en"},{"creatorName":"亀山, 晃弘","creatorNameLang":"ja"},{"creatorName":"カメヤマ, アキヒロ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{},{}]}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"research report","resourceuri":"http://purl.org/coar/resource_type/c_18ws"}]},"item_title":"真空紫外光CVDによる次世代積層型システムLSI作製用要素プロセス技術の開発","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"真空紫外光CVDによる次世代積層型システムLSI作製用要素プロセス技術の開発","subitem_title_language":"ja"},{"subitem_title":"The development of the element process technology for the new type LSI of the product layer by VUV-CVD","subitem_title_language":"en"}]},"item_type_id":"10007","owner":"5","path":["73","44"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2012-12-17"},"publish_date":"2012-12-17","publish_status":"0","recid":"3175","relation_version_is_last":true,"title":["真空紫外光CVDによる次世代積層型システムLSI作製用要素プロセス技術の開発"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2023-09-06T06:23:54.375860+00:00"}