{"created":"2023-05-15T09:58:54.375684+00:00","id":2963,"links":{},"metadata":{"_buckets":{"deposit":"7ccd627a-45e6-412f-b0af-34851e857bd4"},"_deposit":{"created_by":5,"id":"2963","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"2963"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00002963","sets":["73","73:36","73:36:330","73:36:330:320"]},"author_link":["11920","15702","15701","28621"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-09-30","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"124","bibliographicPageStart":"117","bibliographicVolumeNumber":"39","bibliographic_titles":[{"bibliographic_title":"宮崎大学工学部紀要","bibliographic_titleLang":"ja"},{"bibliographic_title":"Memoirs of Faculty of Engineering, University of Miyazaki","bibliographic_titleLang":"en"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The adsorption processes of (CH3) 3Al (TMA) and H2O on γ-Al2O3 have been studied to obtain the basic data on the self-limiting mechanism in the atomic layer epitaxy (ALE). The reactant species, TMA and H2O, were transported onto heated Al2O3 surface with the hydrogen carrier gas. The adsorption rate, as a function of the surface coverage of aluminum or oxygen, was estimated from the reactant exposure-time dependence of the deposition thickness of γ-Al2O3. The aluminum and oxygen coverage dependence of the adsorption rate suggested that the TMA and H2O were adsorbed by a precursor-mediated mechanism. The ALE of γ-Al2O3 was investigated on the basis of the adsorption data. The self-limiting mechanism, which automatically stopped the growth at just one monolayer of γ-Al2O3 (001), was observed in the TMA and H2O exposure-duration dependences. A growth model of the γ-Al2O3 ALE successfully explained the growth rate.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宮崎大学工学部","subitem_publisher_language":"ja"},{"subitem_publisher":"Faculty of Engineering, University of Miyazaki","subitem_publisher_language":"en"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00732558","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"05404924","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Ozeki, Masashi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11920","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"原口, 智宏","creatorNameLang":"ja"},{"creatorName":"ハラグチ, トモヒロ","creatorNameLang":"ja-Kana"},{"creatorName":"Haraguchi, Tomohiro","creatorNameLang":"en"}],"familyNames":[{"familyName":"原口","familyNameLang":"ja"},{"familyName":"ハラグチ","familyNameLang":"ja-Kana"},{"familyName":"Haraguchi","familyNameLang":"en"}],"givenNames":[{"givenName":"智宏","givenNameLang":"ja"},{"givenName":"トモヒロ","givenNameLang":"ja-Kana"},{"givenName":"Tomohiro","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"28621","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hirakawa, Keisuke","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"15701","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Uwai, Kohei","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"15702","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-21"}],"displaytype":"detail","filename":"engineering39-19.pdf","filesize":[{"value":"239.6 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"engineering39-19.pdf","url":"https://miyazaki-u.repo.nii.ac.jp/record/2963/files/engineering39-19.pdf"},"version_id":"fee56591-ecb3-4527-8928-730da9873bc8"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Atomic-layer-epitaxy, Self-limiting mechanism, γ-Al2O3, Adsorption","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Adsorption and Self-limiting Mechanisms of Trimethylaluminum and Water on Aluminum Oxide Surface","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Adsorption and Self-limiting Mechanisms of Trimethylaluminum and Water on Aluminum Oxide Surface","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"5","path":["73","36","330","320"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2011-02-25"},"publish_date":"2011-02-25","publish_status":"0","recid":"2963","relation_version_is_last":true,"title":["Adsorption and Self-limiting Mechanisms of Trimethylaluminum and Water on Aluminum Oxide Surface"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2023-10-09T05:21:04.271850+00:00"}