{"created":"2023-05-15T09:58:51.218218+00:00","id":2893,"links":{},"metadata":{"_buckets":{"deposit":"599dea10-d56c-40e3-adcc-23bcb6c0a433"},"_deposit":{"created_by":5,"id":"2893","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"2893"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00002893","sets":["73","73:36","73:36:330","73:36:330:319"]},"author_link":["13738","15288","15291","12047","15287","13733"],"item_10002_alternative_title_1":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"スパッタホウ ニヨル SiC:H ハクマク ノ コウガク・デンキトクセイ ニオケル コウシュウハ デンリョク イゾンセイ"}]},"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2009-09-30","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"38","bibliographicPageStart":"31","bibliographicVolumeNumber":"38","bibliographic_titles":[{"bibliographic_title":"宮崎大学工学部紀要","bibliographic_titleLang":"ja"},{"bibliographic_title":"Memoirs of Faculty of Engineering, University of Miyazaki","bibliographic_titleLang":"en"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"SiC:H films have been deposited by reactive r.f. magnetron sputtering of Si target in hydrogen and methane (diluted by argon) gas mixtures. The effects of hydrogen partial pressme ratio R_H and r.f. power P on the structural, optical, and electrical properties of the films were investigated. With increasing R_H above 90%, a weak SiC (110) peak was observed by X-ray diffraction around 2 θ=60°. On the basis of this condition, the dependence of r.f power P was examined. As a result, it was found that mlcrocrystallization was enhanced by increasing r.f. power.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宮崎大学工学部","subitem_publisher_language":"ja"},{"subitem_publisher":"Faculty of Engineering, University of Miyazaki","subitem_publisher_language":"en"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00732558","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"05404924","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"山脇, 翔太","creatorNameLang":"ja"},{"creatorName":"ヤマワキ, ショウタ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"齋藤, 順雄","creatorNameLang":"ja"},{"creatorName":"サイトウ, ノブオ","creatorNameLang":"ja-Kana"},{"creatorName":"Saito, Nobuo","creatorNameLang":"en"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"Maeda, Koji","creatorNameLang":"en"},{"creatorName":"前田, 幸治","creatorNameLang":"ja"},{"creatorName":"マエダ, コウジ","creatorNameLang":"ja-Kana"},{"creatorName":"Maeda, Kouji","creatorNameLang":"en"}],"familyNames":[{},{},{},{}],"givenNames":[{},{},{},{}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"西岡, 賢祐","creatorNameLang":"ja"},{"creatorName":"ニシオカ, ケンスケ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Yamawaki, Shota","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"齋藤, 順雄","creatorNameLang":"ja"},{"creatorName":"サイトウ, ノブオ","creatorNameLang":"ja-Kana"},{"creatorName":"Saito, Nobuo","creatorNameLang":"en"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Nishioka, Kensuke","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-21"}],"displaytype":"detail","filename":"KJ00005628508.pdf","filesize":[{"value":"3.0 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00005628508.pdf","url":"https://miyazaki-u.repo.nii.ac.jp/record/2893/files/KJ00005628508.pdf"},"version_id":"6ad46b4c-5949-4b57-acbc-142bdac982f1"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Sputtering, SiC, Amorphous, Microcrystallization","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"スパッタ法によるSiC:H薄膜の光学・電気特性における高周波電力依存性","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"スパッタ法によるSiC:H薄膜の光学・電気特性における高周波電力依存性","subitem_title_language":"ja"},{"subitem_title":"R.F. Power Dependence on Optical and Electrical Properties of SiC:H Films Prepared by Magnetron Sputtering","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"5","path":["73","36","330","319"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2009-10-29"},"publish_date":"2009-10-29","publish_status":"0","recid":"2893","relation_version_is_last":true,"title":["スパッタ法によるSiC:H薄膜の光学・電気特性における高周波電力依存性"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2023-11-21T02:26:35.860736+00:00"}