{"created":"2023-05-15T09:58:29.436691+00:00","id":2457,"links":{},"metadata":{"_buckets":{"deposit":"1c85a887-678c-4bc6-9c88-55f78ee7368f"},"_deposit":{"created_by":5,"id":"2457","owner":"5","owners":[5],"pid":{"revision_id":0,"type":"depid","value":"2457"},"status":"published"},"_oai":{"id":"oai:miyazaki-u.repo.nii.ac.jp:00002457","sets":["73","73:36","73:36:330","73:36:330:316"]},"author_link":["12038","12437","12439"],"item_10002_alternative_title_1":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"シンクウ シガイコウ CVDホウ ニ ヨル SiNx ハクマク ノ テイオン サクセイ","subitem_alternative_title_language":"ja-Kana"}]},"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2006-08-30","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"123","bibliographicPageStart":"119","bibliographicVolumeNumber":"35","bibliographic_titles":[{"bibliographic_title":"宮崎大学工学部紀要","bibliographic_titleLang":"ja"},{"bibliographic_title":"Memoirs of Faculty of Engineering, University of Miyazaki","bibliographic_titleLang":"en"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Abstract \nWe have developed a fabrication technique of SiNx films which is expected to use for diffusion \nprotector of ultra thin gate oxide films in high density ICs for next generation by means of the \nVUV-CVD method. Using an Ar2* excimer lamp as a light source and SiH4 and NH3 as row materials, \nwe could successfully obtained SiNx films at room temperature. The films obtained at a substrate \ntemperature above 80℃ were chemically stable, whereas below 80℃ the obtained films are gradually \ndecomposed and changed into SiOx film in the air ambient. For such an unstable film deposited at \n50℃, we have found that photo-annealing by Ar2* excimer lamp after the deposition was quite \neffective to stabilize the chemical component of the film.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"宮崎大学工学部","subitem_publisher_language":"ja"},{"subitem_publisher":"Faculty of Engineering, University of Miyazaki","subitem_publisher_language":"en"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00732558","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"05404924","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"甘利, 紘一","creatorNameLang":"ja"},{"creatorName":"アマリ, コウイチ","creatorNameLang":"ja-Kana"},{"creatorName":"Amari, Kohichi","creatorNameLang":"en"}],"familyNames":[{"familyName":"甘利","familyNameLang":"ja"},{"familyName":"アマリ","familyNameLang":"ja-Kana"},{"familyName":"Amari","familyNameLang":"en"}],"givenNames":[{"givenName":"紘一","givenNameLang":"ja"},{"givenName":"コウイチ","givenNameLang":"ja-Kana"},{"givenName":"Kohichi","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"12439","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"石村, 想","creatorNameLang":"ja"},{"creatorName":"イシムラ, ソウ","creatorNameLang":"ja-Kana"},{"creatorName":"Ishimura, So","creatorNameLang":"en"}],"familyNames":[{"familyName":"石村","familyNameLang":"ja"},{"familyName":"イシムラ","familyNameLang":"ja-Kana"},{"familyName":"Ishimura","familyNameLang":"en"}],"givenNames":[{"givenName":"想","givenNameLang":"ja"},{"givenName":"ソウ","givenNameLang":"ja-Kana"},{"givenName":"So","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"12437","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"0000000106573887","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"https://isni.org/isni/0000000106573887"}],"affiliationNames":[{"affiliationName":"宮崎大学","affiliationNameLang":"ja"},{"affiliationName":"University of Miyazaki","affiliationNameLang":"en"}]}],"creatorNames":[{"creatorName":"横谷, 篤至","creatorNameLang":"ja"},{"creatorName":"ヨコタニ, アツシ","creatorNameLang":"ja-Kana"},{"creatorName":"Yokotani, Atsushi","creatorNameLang":"en"}],"familyNames":[{"familyName":"横谷","familyNameLang":"ja"},{"familyName":"ヨコタニ","familyNameLang":"ja-Kana"},{"familyName":"Yokotani","familyNameLang":"en"}],"givenNames":[{"givenName":"篤至","givenNameLang":"ja"},{"givenName":"アツシ","givenNameLang":"ja-Kana"},{"givenName":"Atsushi","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"12038","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"00183989","nameIdentifierScheme":"e-Rad_Researcher","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=00183989"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"甘利, 紘一","creatorNameLang":"ja"},{"creatorName":"アマリ, コウイチ","creatorNameLang":"ja-Kana"},{"creatorName":"Amari, Kohichi","creatorNameLang":"en"}],"familyNames":[{"familyName":"甘利","familyNameLang":"ja"},{"familyName":"アマリ","familyNameLang":"ja-Kana"},{"familyName":"Amari","familyNameLang":"en"}],"givenNames":[{"givenName":"紘一","givenNameLang":"ja"},{"givenName":"コウイチ","givenNameLang":"ja-Kana"},{"givenName":"Kohichi","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"12439","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"石村, 想","creatorNameLang":"ja"},{"creatorName":"イシムラ, ソウ","creatorNameLang":"ja-Kana"},{"creatorName":"Ishimura, So","creatorNameLang":"en"}],"familyNames":[{"familyName":"石村","familyNameLang":"ja"},{"familyName":"イシムラ","familyNameLang":"ja-Kana"},{"familyName":"Ishimura","familyNameLang":"en"}],"givenNames":[{"givenName":"想","givenNameLang":"ja"},{"givenName":"ソウ","givenNameLang":"ja-Kana"},{"givenName":"So","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"12437","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-21"}],"displaytype":"detail","filename":"KJ00004439499.pdf","filesize":[{"value":"763.9 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00004439499.pdf","url":"https://miyazaki-u.repo.nii.ac.jp/record/2457/files/KJ00004439499.pdf"},"version_id":"065c0dae-b7af-4c9c-9de8-9ea63da88827"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"VUV-CVD, Ar2 excimer lamp, SiNx film, SiH4, NH3, photo-annealing","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"真空紫外光CVD法によるSiNx薄膜の低温作製","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"真空紫外光CVD法によるSiNx薄膜の低温作製","subitem_title_language":"ja"},{"subitem_title":"SiNx thin film modification at low temperature by Vacuum ultraviolet-CVD method","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"5","path":["73","36","330","316"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-06-28"},"publish_date":"2007-06-28","publish_status":"0","recid":"2457","relation_version_is_last":true,"title":["真空紫外光CVD法によるSiNx薄膜の低温作製"],"weko_creator_id":"5","weko_shared_id":2},"updated":"2025-01-09T05:59:57.005144+00:00"}