@article{oai:miyazaki-u.repo.nii.ac.jp:00002453,
 author = {吉岡, 章夫 and 上村, 一秀 and 柳田, 英明 and 黒澤, 宏 and Yokotani, Atsushi and 横谷, 篤至 and Yoshioka, Akio and Uemura, Kazuhide and Yanagita, Hideaki and Kurosawa, Kou and Yokotani, Atushi},
 journal = {宮崎大学工学部紀要, Memoirs of Faculty of Engineering, University of Miyazaki},
 month = {Jul},
 note = {Abstract 
According as element densities in electronic circuit have become extremely high in recent 
years, it is important to understand the information about surfaces and interfaces of materials. 
Then, systems having topography and composition analyses are required. In this research, we 
tried to build a compact and low price surface microanalysis system using laser ablation 
ionization and time of flight mass spectrometer (TOF-MS). The mass resolution of the produced 
equipment was two or less in mass-to-charge ratio. The minimum volume of mass for detection 
was 3.3pg. We measured species and ablation threshold from natural silicon wafer and silica 
glass. Based on the results, we explained the thermal dissociation mechanisms of silicon wafer 
with the oxide film. We performed quantitative analysis for 4% BF2+ doped silicon wafer and 
could determine the B+ composition.},
 pages = {107--113},
 title = {飛行時間型質量分析法による表面微量分析技術の開発},
 volume = {32},
 year = {2003},
 yomi = {ヨシオカ, アキオ and ウエムラ, カズヒデ and ヤナギタ, ヒデアキ and クロサワ, コウ and ヨコタニ, アツシ}
}