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  1. 工学部
  1. 工学部
  2. 学術雑誌掲載論文 (工学部)

Development of thermally stable FTO thin films on quartz substrates for carrier collection in semiconductor photoelectrodes

http://hdl.handle.net/10458/0002001165
http://hdl.handle.net/10458/0002001165
5e628b7b-b489-4217-a050-a4b7a8a72b0d
名前 / ファイル ライセンス アクション
Revised Revised manuscript (1.4 MB)
Revised Revised Supporting information (11.1 MB)
アイテムタイプ 学術雑誌論文 / Journal Article(1)
公開日 2025-04-08
タイトル
タイトル Development of thermally stable FTO thin films on quartz substrates for carrier collection in semiconductor photoelectrodes
言語 en
言語
言語 eng
資源タイプ
資源タイプ journal article
アクセス権
アクセス権 open access
著者 東, 智弘

× 東, 智弘

WEKO 35376
e-Rad_Researcher 80762088

ja 東, 智弘
宮崎大学

ja-Kana ヒガシ, トモヒロ

en Higashi, Tomohiro
University of Miyazaki

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Fukagawa, Shintaro

× Fukagawa, Shintaro

en Fukagawa, Shintaro

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Wakishima, Kaisei

× Wakishima, Kaisei

en Wakishima, Kaisei

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Yoshiyama, Koichi

× Yoshiyama, Koichi

en Yoshiyama, Koichi

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Narita, Yuki

× Narita, Yuki

en Narita, Yuki

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吉野, 賢二

× 吉野, 賢二

WEKO 12061
e-Rad_Researcher 80284826

ja 吉野, 賢二
宮崎大学

ja-Kana ヨシノ, ケンジ

en Yoshino, Kenji
University of Miyazaki

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抄録
内容記述タイプ Abstract
内容記述 The development of transparent conductive oxide (TCO) materials is crucial for establishing effective photogenerated carrier transportation in solar-to-chemical energy conversion processes. In this study, we utilized the spray pyrolysis technique to develop F-doped tin oxide (FTO) thin films on double-sided polished quartz substrates, to produce TCO with superior thermal durability. This has enabled the production of semiconductor-based photoelectrodes. We successfully fabricated FTO films with thicknesses of 650–750 nm on quartz substrates. Hall effect measurements revealed that the FTO prepared on quartz (FTO/quartz) had resistivity, carrier concentration, and Hall mobility comparable to those of commercial FTO-coated soda lime glass (FTO/glass). The light transmittance in the visible and near-infrared regions satisfied the TCO criteria. The thermal stability was assessed by post-annealing the samples in air at specific temperatures. Up to 700 °C in air, the variations in resistivity and transmittance were minimal. However, post-annealing above 800 °C eventually caused a substantial increase in resistivity. Microscopic and spectroscopic analyses indicated enhanced SnO2 crystallinity owing to F-dopant elimination and film cracking. This yielded an increased resistivity. Furthermore, we fabricated a p-type CuBi2O4 semiconductor conjugated with FTO/quartz and evaluated the photoelectrochemical (PEC) properties. Unlike the use of conventional FTO/glass substrates, CuBi2O4/FTO/quartz maintained PEC functionality under simulated AM 1.5G solar illumination with H2O2 as a sacrificial reagent. This study has provided the potential for the development of semiconductor materials, including surface modification techniques requiring high-temperature treatments. Furthermore, it would contribute to material design strategies for efficient solar-to-chemical energy conversion systems.
言語 en
内容記述
内容記述タイプ Other
内容記述 Citation: Tomohiro Higashi, Shintaro Fukagawa, Kaisei Wakishima, Koichi Yoshiyama, Yuki Narita, Kenji Yoshino, Development of thermally stable FTO thin films on quartz substrates for carrier collection in semiconductor photoelectrodes, Journal of Materials Chemistry C, 12(40), 16443-16458, 2024, https://doi.org/10.1039/d4tc02823f
言語 en
bibliographic_information en : Journal of Materials Chemistry C

巻 12, 号 40, p. 16443-16458, 発行日 2024-09-09
出版者
出版者 Royal Society of Chemistry (RSC)
言語 en
ISSN
収録物識別子タイプ PISSN
収録物識別子 2050-7526
ISSN
収録物識別子タイプ EISSN
収録物識別子 2050-7534
item_10001_relation_14
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1039/d4tc02823f
出版タイプ
出版タイプ AM
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