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ジキ チュウセイセン ホウデン プラズマ オ モチイタ カーボン ナノチューブ ノ サクセイ 磁気中性線放電プラズマを用いたカーボンナノチューブの作製 Production of Carbon Nanotubes by Neutral Loop Discharge Plasma 川尻, 晋平 15997 カワシリ, シンペイ Kawashiri, Shinpei 楊, 鍾煥 12398 井上, 大士 12399 イノウエ, ダイシ Sung, Youl-Moon 6715 Sung, Youl Moon 成, 烈汶 ソン, ヤルブン 大坪, 昌久 6637 オオツボ, マサヒサ Otsubo, Masahisa 本田, 親久 6647 ホンダ, チカヒサ Honda, Chikahisa 川尻, 晋平 15997 カワシリ, シンペイ Kawashiri, Shinpei Yang, Jong Hwan 12404 Inoue, Daishi 12405 Sung, Youl-Moon 6715 Sung, Youl Moon 成, 烈汶 ソン, ヤルブン Neural Loop Discharge(NLD), Carbon Nanotubes(CNT) Recently, the big diameter making of the wafer is rapidly advanced with the ultrafine processing technology of 0.1μm in the minimum in recent semiconductor manufacturing process line width in the process of the semiconductor. Then, the plasma source by which a uniform process in a large area can be done is requested. Then, the NLD (Neutral Loop Discharge) plasma was proposed. Because the NLD plasma can dynamically control impossible plasma in past plasma, a highly effective process can be done. However, it is a current state of being limited from the structure only to the etching field now, We have aimed to pioneer the NLD plasma to a new field by applying a peculiar concept of the NLD plasma to the CNT (Carbon Nanotubes) making. departmental bulletin paper 宮崎大学工学部 Faculty of Engineering, University of Miyazaki 2006-08-30 VoR application/pdf 宮崎大学工学部紀要 35 101 106 Memoirs of Faculty of Engineering, University of Miyazaki AA00732558 05404924 https://miyazaki-u.repo.nii.ac.jp/record/2454/files/KJ00004439496.pdf http://hdl.handle.net/10458/421 https://miyazaki-u.repo.nii.ac.jp/records/2454 jpn