Recently, there is a strong demand for the crystal device because the demand for various multimedia products increases rapidly. Therefore, the technology that manufactures synthetic quartz in large quantities quickly is needed. The micro manufacturing technology such as the photolithography technology is widely applied in an electronic industrial field. Therefore, the material that is free from linear defect and lattice defect is requested. To keep the high quality, it is necessary to prevent micro particle called Inclusion from mixing internally during the growth process of crystal. In general, the synthetic quartz is manufactured by the hydrothermal growth method in an autoclave. In this research, an autoclave size is over 600mm diameter and 14m internal depth. It is difficult to experiment in the autoclave, because it has a high temperature of over 300℃ and a high pressure about 1200 atmospheres. Therefore, it is important to clarify the flow field in the autoclave by the numerical analysis for the enlargement of the autoclave, the quality improvement of the synthetic quartz, the cost reduction and the processing technology development of the synthetic quartz.
雑誌名
Memoirs of the Faculty of Engineering, University of Miyazaki
巻
39
ページ
239 - 246
発行年
2010-09-30
出版者
宮崎大学工学部
Faculty of Engineering, University of Miyazaki